WHU team boosts efficiency of AlGaN-based DUV emitter by manipulating precursors of group-III nitrides for p-Al 0.8 Ga 0.2 N electron blocking layer Researchers from Wuhan University in China have ...

The most recent steps toward footprint reduction pit EUV patterning against traditional ArF SADP and SAQP processes for cutting-edge 2D DRAM, according to Daniel Soden, business development ...

UVC microLED shows viability of cheaper maskless photolithography, enabling quicker exposure of photoresist films A team from Hong Kong University of Science and Technology (HKUST) has developed a ...